LaboratoryNanofabrication Laboratory

The Nanofabrication Laboratory contains facilities for semiconductor material processing, nanofabrication, sensor and microfluidic device development. The equipment in the Nanofabrication Laboratory covers most aspects of semiconductor device fabrication, from materials growth and characterisation to device packaging. The principal tools are: - Two-Photon Polymerization 3D Printer (Nanoscribe Photonic Professional GT2), - Electron Beam Lithography (Raith 150), - Deep Reactive Ion Etching (PlasmaPro 100 Cobra), - Optical Microscopy (Olympus BX30 with digital image capture), - Atomic Force Microscope (Digital Instruments Dimension 3100), - Plasma Ashing (Tergeo plasma cleaner, Henniker HPT-200 plasma treatment), - Optical Lithography (Suss MA-6), - Nanoimprint Lithography (EVG), - Interference Lithography, - Spin-coating (Laurell WS-650 and Headway PWM32-PS-R790), - Thin-Film Deposition (Edwards AUTO 500, - Temescal FC-1800 and Mist CVD), - Semiconductor Device Characterisation (HP 4155A and Keysight B1500 Parameter Analysers), - Optical Profilometer (Filmetrics Profilm3D), - Stylus Profilometer (Taylor-Hobson Intra-Touch), -Wire Bonding (Kulicke & Soffa 4500), - Micromilling (CNC Mini- Mill/GX, Datron Neo), - Variable Temperature Hall Effect Measurement (Ecopia HMS-5500). This is the main fabrication facility for the inter-departmental Nanostructure Engineering, Science and Technology research group, as well as the MacDiarmid Institute for Advanced Materials and Nanotechnology and the Biomolecular Interaction Centre.

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