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EquipmentSuss MA-6 Mask Aligner

Nano Lab

Description

Compact Optical Lithography Platform for Research and Low-Volume Production of up to 4" wafers with top-side alignment

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AVAILABLE FOR INTERNAL & EXTERNAL USE|FEES APPLY|TRAINING AVAILABLE

Contacts

DEPARTMENT

  • Electrical and Computer Engineering

BUILDING

  • Engineering - Link

AVAILABILITY

  • Available for internal & external use

Location

Nano Lab