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EquipmentOxford PlasmaPro 100 Cobra - Inductively-coupled plasma (ICP) etching tool

Nano Lab

Description

Inductively-coupled plasma (ICP) etching tool which uses a radio frequency (RF) energy coupled into a low pressure gas by an inductive coil. This technique allows fabrication of high aspect ratio silicon features with vertical sidewalls.

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AVAILABLE FOR INTERNAL & EXTERNAL USE|FEES APPLY|TRAINING AVAILABLE

Contacts

DEPARTMENT

  • Electrical and Computer Engineering

BUILDING

  • Engineering - Link

AVAILABILITY

  • Available for internal & external use

Location

Nano Lab