EquipmentLaurell WS-650 spin coater

Nano Lab

Description

Table top photoresist spin-coater in Yellow Room environment The Laurell WS-650 spin coater is compact and packed with advanced features. This 650-series coater system will accommodate up to ø150mm wafers and 5" × 5" (127mm × 127mm) substrates, and features a maximum rotational speed of 12,000 RPM (based on a ø100mm silicon wafer).

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DEPARTMENT

  • Electrical and Computer Engineering

BUILDING

  • Engineering - Link

AVAILABILITY

  • Available for internal & external use

Location

Nano Lab