Skip to main contentAll facilities & equipment

EquipmentEVG620 Top Side Mask Aligner & Nanoimprinting System

Nanolab

Description

The EVG620 is a versatile mask aligner designed for optical double-side lithography, capable of top-side and bottom-side alignment with high precision. It also supports nanoimprint lithography, allowing for the patterning of extremely small features down to less than 40 nm

MORESEE MORE (opens in a new tab)
FEES APPLY|TRAINING AVAILABLE

Contacts

DEPARTMENT

  • Electrical and Computer Engineering

BUILDING

  • Engineering - Link

AVAILABILITY

  • Not currently available for use

Location

Nanolab